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Industrial laser system
Semiconductor Selective Laser Annealing System
The AOGEO selective laser annealing system delivers controlled thermal processing to defined wafer regions. Applications include dopant activation, contact-interface formation and thermal treatment of functional layer...
Process and acceptance details
Semiconductor Selective Laser Annealing System
The AOGEO selective laser annealing system delivers controlled thermal processing to defined wafer regions. Applications include dopant activation, contact-interface formation and thermal treatment of functional layers. Energy distribution, exposure strategy and thermal management are configured around the device structure and the purpose of the annealing step.
- Applications: Address specified silicon device regions, power-device backsides or metallized SiC contact areas. Select the process route according to activation requirements, contact resistance and the thermal budget of nearby device structures.
- Process inputs and outputs: Inputs include wafers carrying implanted regions, metal layers or defined functional films, together with treatment maps and thermal limits. Outputs are processed wafers, recipe records and the agreed electrical measurements.
- Configuration discussion: Review wavelength, pulse format, spot or line-beam delivery, energy uniformity, scan overlap, alignment, wafer temperature control and process atmosphere. Define monitoring, handling and data interfaces alongside the optical process.
- Quality and acceptance: Check sheet resistance or contact resistance, regional uniformity, film morphology, surface changes and wafer bow. Compare electrical behavior before and after processing, with repeat measurements under the agreed environmental or reliability conditions.
- RFQ information: Provide the device stack, implantation or metallization information, target electrical parameters, treatment-area drawings and allowed thermal exposure. Include representative samples, measurement methods, protected structures and requirements for integration with adjacent production steps.
Explore semiconductor laser applications or submit your annealing process requirements.
Equipment capability overview
Review process, material and automation fit at a glance. Final configuration is confirmed against your part, cycle time and quality targets.
Move from equipment to a complete solution
Evaluate the machine in the context of process, industry and material requirements to compare routes and plan validation.
Engineering selection starts with four inputs
A model number is only a starting point. Define the part, target, cycle time and integration conditions to build a verifiable configuration.
Part & material
Provide material, dimensions, thickness, surface condition and fixturing requirements.
Process & quality targets
Define the required result, precision, appearance and consistency criteria.
Cycle time & output
Provide target cycle time, shifts, loading method and changeover frequency to size the system correctly.
Automation & interfaces
Evaluate vision, traceability, robotics, material handling and production-line communication requirements.
Questions before starting a project
Confirm the project boundary before sample testing and engineering configuration to reduce selection cycles.
View service & supportWhat information is needed before equipment selection?
Share part drawings or photos, material and thickness, process location, quality standard, target cycle time, and automation or interface requirements.
Is the configuration shown in the video final?
Videos illustrate operation and process direction. Laser source, optics, motion, tooling, vision and safety are configured for the actual part and project targets.
Do you support sample testing and process validation?
Yes. Submit materials, drawings and acceptance criteria; after the test scope is agreed, results can guide equipment selection.
How is the delivery scope defined?
The agreed project documents define the scope, which may include equipment, process validation, tooling, automation, training and service support.
Semiconductor technical guides
Selection and acceptance guides for this system
Selective Laser Annealing vs Rapid Thermal Annealing
Compare selective laser annealing and RTA by activation or contact task, stack thermal history, uniformity and electrical and structural acceptance...
Read the guide Equipment selection guidesSemiconductor Laser Equipment RFQ Checklist: Samples, Specifications and Scope
Prepare a comparable semiconductor laser equipment RFQ with a controlled material stack, representative samples, measurable quality criteria, full-...
Read the guide Process validation guidesSemiconductor Laser System FAT and SAT: Build an Acceptance Matrix
Plan semiconductor laser equipment acceptance around controlled samples, measurement methods, complete-cycle timing, interfaces, exception recovery...
Read the guideTurn your part requirements into a validated laser process
Share your material, dimensions, quality targets and cycle time. Our engineering team will recommend the next validation step.